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06 April 2020 | Story Nitha Ramnath | Photo Sonia Small
Students on Campus
UFS accounting students are flying the Kovsie flag high.

The School of Accountancy is proud to announce that 55 (74%) of the 2019 graduates for the BAcc Honours and Postgraduate Diploma in Chartered Accountancy programmes have passed the Initial Test of Competence (ITC) examination for the Chartered Accountant (SA) designation, compared to the national average of 68% for first-time candidates.

The results were recently released by the South African Institute of Chartered Accountants (SAICA). The ITC examination is the first of two professional examinations required for qualification as a chartered accountant (SA), and is written shortly after completing formal university studies, with two sittings of this examination annually, i.e. in January and June.

Of the 2019 Thuthuka Bursary Programme, seven out of eight graduates passed, translating into an 88% pass rate for this group.

Prof Frans Prinsloo, Director of the School of Accountancy, said: “I am pleased to report that these results confirm the quality and excellence of our CA programmes – a point repeatedly noted by the SAICA monitoring team during their formal feedback session last week.  These results are also testament to the hard work and dedication of the academic staff in the school.”

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Young UFS scientist wins international award
2010-10-29

 Prof. Martin Ntwaeaborwa

The thin films division of the American Vacuum Society (AVS) selected Prof. Martin Ntwaeaborwa from the Department of Physics at the University of the Free State (UFS) as the 2010 awardee of the Paul Holloway Young Investigator Award.

Prof. Ntwaeaborwa has been given the award for novel work in the field of nanostructured luminescent materials, the optical properties of nanoparticles and photovoltaic applications. The award is named after Prof. Paul H. Holloway of the University of Florida who has a distinguished and continuing career of scholarship and service to the AVS.

 The nominee must be a young scientist or engineer who has contributed outstanding theoretical and experimental work in an area important to the Thin Film Division of AVS.

 

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