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09 February 2022 | Story Lacea Loader

After careful consideration and in consultation with various stakeholders, the management of the University of the Free State (UFS) today decided that the online registration period will be extended by one week until Friday 18 February 2022.

In line with this decision, classes will commence on Monday 21 February 2022, to give students enough time to register and prepare for their academic activities.

The university’s decision to extend the online registration period derives, among others, from logistical and external factors that contributed to students only being able to register from the week of 7 February 2022.

Channels available for students to contact the university during the registration period:

► Central contact centre: +27 51 401 9111 (if you want to speak to one of our agents)

Central contact centre booklet
► WhatsApp chatbot: +27 87 240 6370 (if students want to conduct an online chat conversation via text messages)

Registration assistance: System-based online registration assistance functionality through the UFS website

Comprehensive registration information is available at:   www.ufs.ac.za/register

Visit https://www.ufs.mobi/register and follow the checklist #StepbyStep 2022 online registration.

News Archive

Young UFS scientist wins international award
2010-10-29

 Prof. Martin Ntwaeaborwa

The thin films division of the American Vacuum Society (AVS) selected Prof. Martin Ntwaeaborwa from the Department of Physics at the University of the Free State (UFS) as the 2010 awardee of the Paul Holloway Young Investigator Award.

Prof. Ntwaeaborwa has been given the award for novel work in the field of nanostructured luminescent materials, the optical properties of nanoparticles and photovoltaic applications. The award is named after Prof. Paul H. Holloway of the University of Florida who has a distinguished and continuing career of scholarship and service to the AVS.

 The nominee must be a young scientist or engineer who has contributed outstanding theoretical and experimental work in an area important to the Thin Film Division of AVS.

 

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